OBA / M1-M2 Structural Diagnostics



Whitepaper v1.1 · Atlas-bound methodology

ARBE λ* Structural Diagnostics for OBA Papers under M1/M2

A methodological whitepaper positioning ARBE λ* as an additional structural diagnostic layer for optically brightened papers in proofing and print quality control.

Atlas-bound

Valid interpretation requires a verified reference of the form Hxxx_Lxxx_Cxxx.

Not a replacement

ARBE λ* is not a replacement for ISO 13655, CIEDE2000, FOGRA/ECI, ICC workflows or visual assessment.

M1/M2 separation

M1 and M2 tracks are treated separately. Silent M1-versus-M2 comparison is invalid.

Core position

ΔE and ΔE00 describe colourimetric proximity. ARBE λ* describes atlas-bound structural drift when master, probe and measurement condition belong to a defined comparison class.

Canonical rule: Without Hxxx_Lxxx_Cxxx, there is no atlas-bound ARBE single-colour analysis.

Comparison classes

Class 1: Process Drift Mode

Physical master versus physical probe. In this class, ΔΔλ* can be interpreted as a process-drift indicator when substrate family, measurement condition, instrument state and geometry remain stable.

Class 2: Reference Offset Mode

Digital atlas master versus physical probe. A large ΔΔλ* value is a diagnostic reference-family marker, not an automatic production stop.

ARBE structural attributes

AttributeRole
λ*_EEEqual-energy centroid of the measured or atlas-bound spectral structure.
λ*_V2Brent-solved energetic balance point.
Δλ*Internal spacing between λ*_V2 and λ*_EE.
ΔΔλ*Drift indicator between probe and master.

The ARBE λ* evaluation band is 380–730 nm. Raw measurement bands may be wider and must be reported separately.

QC interpretation

|ΔΔλ*|FlagClass 1Class 2
≤ 5 nmSTABLEProcess stable; routine release may be permissible.Minimal structural variance to reference family.
≤ 10 nmWATCHIncrease monitoring; verify process and instrument state.Measurable material/OBA-sensitive offset.
≤ 20 nmREVIEWAudit process, substrate, ink film, calibration and M1/M2 tracks.Pronounced structural offset; consider physical master creation.
> 20 nmBLOCKHalt production release until reviewed.Out-of-reference-family diagnostic marker.

In Class 2, flags are diagnostic only and must not be used as automatic production release or rejection decisions.